Collaboration will aim to support materials development and speed innovation.
The post Gelest Announces Collaboration with IBM to Test Dry Resist EUV Lithography Precursors appeared first on Semiconductor Digest.
Gelest Partners with IBM to Advance Dry Resist EUV Lithography
Gelest, Inc. has announced a collaboration with IBM to test precursor materials for dry resist EUV lithography. This partnership aims to accelerate innovation in semiconductor manufacturing, particularly for logic and DRAM technologies.
AI Summary
Gelest, Inc. has announced a collaboration with IBM to test precursor materials for dry resist EUV lithography. This partnership aims to accelerate innovation in semiconductor manufacturing, particularly for logic and DRAM technologies.
FAQs
What is the purpose of the collaboration between Gelest and IBM?
The collaboration aims to test Gelest's precursor materials for dry resist EUV lithography, enhancing semiconductor manufacturing.
Who is presenting at the upcoming industry events?
Allison Bezden and Dr. Li Yang will present at Semicon Korea and SPIE Advanced Lithography + Patterning, respectively.
What is dry resist EUV lithography?
Dry resist EUV lithography is an advanced semiconductor manufacturing technique used for producing smaller and more efficient microelectronic devices.
When did Gelest open its new production facility?
Gelest opened its new 50,000-square-foot production facility in May 2025.
What are the expected outcomes of the collaboration?
The collaboration is expected to inform future material development and accelerate innovation in semiconductor technologies.
Cite this article
HTML citation
<a href="https://desdunia.com/semiconductors/gelest-announces-collaboration-with-ibm-to-test-dry-resist-euv-lithography-precursors" target="_blank" rel="nofollow noopener">Gelest Partners with IBM to Advance Dry Resist EUV Lithography</a> (Desdunia, 2026-02-05)
Markdown citation
[Gelest Partners with IBM to Advance Dry Resist EUV Lithography](https://desdunia.com/semiconductors/gelest-announces-collaboration-with-ibm-to-test-dry-resist-euv-lithography-precursors) — Desdunia (2026-02-05)
Plain URL
https://desdunia.com/semiconductors/gelest-announces-collaboration-with-ibm-to-test-dry-resist-euv-lithography-precursors
Embed code
<blockquote cite="https://desdunia.com/semiconductors/gelest-announces-collaboration-with-ibm-to-test-dry-resist-euv-lithography-precursors">Gelest Partners with IBM to Advance Dry Resist EUV Lithography</blockquote>
<p>Source: <a href="https://desdunia.com/semiconductors/gelest-announces-collaboration-with-ibm-to-test-dry-resist-euv-lithography-precursors" target="_blank" rel="nofollow noopener">Desdunia</a></p>